High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS
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Peter Vettiger | Jürgen Brugger | Michel Despont | Hubert Lorenz | M. Despont | P. Renaud | P. Vettiger | J. Brugger | H. Lorenz | N. Fahrni | Philippe Renaud | Nicolas Fahrni
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