Characteristics of surface states and charge neutrality level in Ge
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Duygu Kuzum | Krishna C. Saraswat | Tejas Krishnamohan | Koen Martens | K. Saraswat | T. Krishnamohan | K. Martens | D. Kuzum
[1] A. Dimoulas,et al. Modeling of negatively charged states at the Ge surface and interfaces , 2009 .
[2] Alfredo Pasquarello,et al. Defect levels of dangling bonds in silicon and germanium through hybrid functionals , 2008 .
[3] Y. Oshima,et al. Ge-Interface Engineering With Ozone Oxidation for Low Interface-State Density , 2008, IEEE Electron Device Letters.
[4] Chi On Chui,et al. On the Correct Extraction of Interface Trap Density of MOS Devices With High-Mobility Semiconductor Substrates , 2008, IEEE Transactions on Electron Devices.
[5] Tomonori Nishimura,et al. Evidence for strong Fermi-level pinning due to metal-induced gap states at metal/germanium interface , 2007 .
[6] E. K. Evangelou,et al. Fermi-level pinning and charge neutrality level in germanium , 2006 .
[7] H. Lüth. Solid Surfaces, Interfaces and Thin Films , 2001 .
[8] F. G. Allen,et al. Photoelectric properties and work function of cleaved germanium surfaces , 1964 .