MULTILEVEL INTERCONNECTION FAILURE ANALYSIS
暂无分享,去创建一个
Resistive Contrast Imaging (RCI) is a new failure analysis technique that uses a scanning electron microscope to generate a relative resistance map of an integrated circuit. The RCI map may be used to localize abrupt changes in resistance and verify continuity. Results using RCI on several two-level interconnection devices are described. The images demonstrate how RCI may be used to differentiate between levels and to localize metal shorts and opens. Methods for improving image quality and level differentiation as well as future development work are discussed.
[1] Erich Kubalek,et al. Fundamentals of electron beam testing of integrated circuits , 1983 .
[2] Massimo Vanzi,et al. Observation of latch-up phenomena in CMOS ICs by means of digital differential voltage contrast , 1986 .
[3] W. Reiners. Fundamentals of electron beam testing via capacitive coupling voltage contrast , 1990 .