Ultrathin-body Ge-on-insulator wafers fabricated with strongly bonded thin Al2O3/SiO2 hybrid buried oxide layers
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K. Ikeda | Y. Kamimuta | T. Tezuka | Yoshiaki Nakamura | K. Izunome | Y. Moriyama | S. Takeuchi | A. Sakai | Y. Nakamura
暂无分享,去创建一个
K. Ikeda | Y. Kamimuta | T. Tezuka | Yoshiaki Nakamura | K. Izunome | Y. Moriyama | S. Takeuchi | A. Sakai | Y. Nakamura