论文信息 - Deposition of device quality silicon nitride with ultra high deposition rate (> 7 nm/s) using hot-wire CVD - 字舞流文

Deposition of device quality silicon nitride with ultra high deposition rate (> 7 nm/s) using hot-wire CVD

R. Schropp | C.H.M. van der Werf | V. Verlaan | I. Romijn | A. Weeber | H. Goldbach | Z. Houweling | C. V. D. Werf