论文信息 - High-k dielectrics' radiation response to X-ray and γ-ray exposure

High-k dielectrics' radiation response to X-ray and γ-ray exposure

Radiation-induced degradation of HfO<inf>2</inf>, ZrO<inf>2</inf>, LaAlO<inf>3</inf>, and NdAlO<inf>3</inf> thin films was studied and compared based on a Fe<sup>55</sup> X-ray source and Cs<sup>137</sup> γ-ray source. After the X-ray exposure of a total dose of 100krad, negative VFB shifts were observed in these thin films, whereas after the γ-ray exposures of the same dose, positive VFB shifts was observed.

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