Chloride-based CVD growth of silicon carbide for electronic applications.

Chloride-Based CVD Growth of Silicon Carbide for Electronic Applications Henrik Pedersen,* Stefano Leone, Olof Kordina, Anne Henry, Shin-ichi Nishizawa, Yaroslav Koshka, and Erik Janz en Department of Physics, Chemistry and Biology, Link€oping University, SE-581 83 Link€oping, Sweden National Institute of Advanced Industrial Science and Technology (AIST), Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan Department of Electrical and Computer Engineering, Mississippi State University, Mississippi State, Mississippi 39762, United States

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