Silicide formation during reaction between Ni ultra-thin films and Si(0 0 1) substrates
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N. Boudet | D. Mangelinck | O. Thomas | M. Texier | M. Richard | C. Guichet | A. Portavoce | O. Thomas | J. Fouet
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N. Boudet | D. Mangelinck | O. Thomas | M. Texier | M. Richard | C. Guichet | A. Portavoce | O. Thomas | J. Fouet