论文信息 - A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm - 字舞流文

A Novel Dry Selective Isotropic Atomic Layer Etching of SiGe for Manufacturing Vertical Nanowire Array with Diameter Less than 20 nm

Jianfeng Gao | A. Du | Guilei Wang | Junfeng Li | H. Yin | Huilong Zhu | H. Radamson | Tao Yang | Wenwu Wang | Z. Kong | Hongxiao Lin | Jianghao Han | Junjie Li | Qingzhu Zhang | Xiaolei Wang | J. Xiang | Hong Yang | Yongkui Zhang | N. Zhou | Yongliang Li | Xueli Ma | Xiaogen Yin | Chen Li | Yangyang Li | Jing Zhang | Tairan Hu | Junjie Li