A Comparative Study of Single and Double Langmuir Probe Techniques for RF Plasma Characterization
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Ronaldo Domingues Mansano | Patrick Verdonck | Marcos Massi | H. S. Maciel | Homero S. Maciel | Giuseppe A. Cirino | R. M. Castro | P. Verdonck | M. Pisani | R. Mansano | G. Cirino | H. Maciel | M. Massi | Raul M. Castro | Marcelo B. Pisani
[1] J. Rees,et al. A self-compensating Langmuir probe for use in rf (13.56 MHz) plasma systems , 1991 .
[2] J. Allen,et al. On the use of double probes in RF discharges , 1992 .
[3] A. Sonin. FREE-MOLECULE LANGMUIR PROBE AND ITS USE IN FLOWFIELD STUDIES , 1966 .
[4] J. Slatter,et al. Electrical measurements of RF-generated plasmas using a driven electrostatic probe technique , 1987 .
[5] E. Benck,et al. Comparison of electron density measurements in planar inductively coupled plasmas by means of the plasma oscillation method and Langmuir probes , 1998 .
[6] R. R. J. Gagné,et al. Investigation of an rf Plasma with Symmetrical and Asymmetrical Electrostatic Probes , 1972 .
[7] L. Malter,et al. A Floating Double Probe Method for Measurements in Gas Discharges , 1950 .
[8] I. Langmuir,et al. The Theory of Collectors in Gaseous Discharges , 1926 .
[9] R. Hill. Characterization of a low pressure, high ion density, plasma metal etcher , 1996 .
[10] J. McVittie,et al. A tuned Langmuir probe for measurements in rf glow discharges , 1990 .
[11] A. Boschi,et al. Effect of a R.F, signal on the characteristic of a langmuir probe , 1963 .
[12] Eric C. Benck,et al. Langmuir Probe Measurements in an Inductively Coupled Plasma Source , 1997 .
[13] C. Steinbrüchel,et al. A new method for analyzing Langmuir probe data and the determination of ion densities and etch yields in an etching plasma , 1990 .
[14] Huma Ashraf,et al. Advanced silicon etching using high-density plasmas , 1995, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.
[15] N. Hershkowitz,et al. Langmuir probe characteristics in RF glow discharges , 1988 .
[16] M. Tuszewski,et al. The accuracy of Langmuir probe ion density measurements in low-frequency RF discharges , 1996 .
[17] L. Talbot,et al. Collisionless Electrostatic Single-Probe and Double-Probe Measurements , 1970 .
[18] Francis F. Chen,et al. RF compensated probes for high-density discharges , 1994 .
[19] J. Engemann,et al. Langmuir probe measurements in commercial plasma plants , 1994 .
[20] Brian A. Smith,et al. Improvements to the floating double probe for time-resolved measurements in pulsed rf plasmas , 1998 .