Highly strained direct bandgap Germanium cavities for a monolithic laser on Si
暂无分享,去创建一个
J. Rothman | V. Reboud | J. Widiez | F. Rieutord | I. Duchemin | A. Gassenq | K. Guilloy | S. Tardif | N. Pauc | A. Tchelnokov | E. Marin | R. Geiger | H. Sigg | J. Faist | J. Hartmann | J. Escalante | J. Widiez | Y. Niquet | I. Duchemin | S. Tardif | T. Zabel | E. Marin | R. Geiger | C. Bozon | K. Guilloy | A. Gassenq | J. Rothman | N. Pauc | F. Rieutord | V. Reboud | V. Calvo | A. Tchelnokov | H. Sigg | J. Faist | J. M. Hartmann | T. Zabel | V. Calvo | C. Bozon | J. Escalante | Y. M. Niquet
[1] J. Faist,et al. Excess carrier lifetimes in Ge layers on Si , 2014 .
[2] Jérôme Faist,et al. Analysis of enhanced light emission from highly strained germanium microbridges , 2013, Nature Photonics.
[3] J. Faist,et al. Lasing in direct-bandgap GeSn alloy grown on Si , 2015, Nature Photonics.