论文信息 - Thermodynamic Stability of High-K Dielectric Metal Oxides ZrO 2 and HfO 2 in Contact with Si and SiO2 - 字舞流文

Thermodynamic Stability of High-K Dielectric Metal Oxides ZrO 2 and HfO 2 in Contact with Si and SiO2

Raghaw Rai | Rama I. Hegde | Maciej Gutowski | Philip J. Tobin | M. Stoker | M. Gutowski | J. Jaffe | R. Hegde | R. Rai | P. Tobin | John E. Jaffe | Chun-Li Liu | Matt Stoker | Chun-Li Liu

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