Statistical model of the NBTI-induced threshold voltage, subthreshold swing, and transconductance degradations in advanced p-FinFETs
暂无分享,去创建一个
B. Kaczer | P. Weckx | D. Linten | T. Chiarella | N. Horiguchi | A. Spessot | J. Franco | A. Mocuta | Ph. J. Roussel | L. Trojman | S. Mukhopadhyay | P. Duhan | L.-Å Ragnarsson
[1] C. Auth,et al. Bias temperature instability variation on SiON/Poly, HK/MG and trigate architectures , 2014, 2014 IEEE International Reliability Physics Symposium.
[2] T. Grasser,et al. Impact of Individual Charged Gate-Oxide Defects on the Entire $I_{D}$–$V_{G}$ Characteristic of Nanoscaled FETs , 2012, IEEE Electron Device Letters.
[3] M. Denais,et al. NBTI degradation: From physical mechanisms to modelling , 2006, Microelectron. Reliab..
[4] X. Federspiel,et al. BTI variability fundamental understandings and impact on digital logic by the use of extensive dataset , 2013, 2013 IEEE International Electron Devices Meeting.
[5] R. Degraeve,et al. Origin of NBTI variability in deeply scaled pFETs , 2010, 2010 IEEE International Reliability Physics Symposium.
[6] D. Schroder. Semiconductor Material and Device Characterization , 1990 .
[7] Andrew R. Brown,et al. RTS amplitudes in decananometer MOSFETs: 3-D simulation study , 2003 .
[8] B. Kaczer,et al. Degradation of time dependent variability due to interface state generation , 2013, 2013 Symposium on VLSI Technology.