Removal of low concentrations of acid gases: issues and solutions

Part per billion concentrations of acid gases such as SOx and NOx have been detected in both high purity gases and CDA lines. These contaminants can have deleterious effects on a number of high purity applications such as the optics found in lithography equipment steppers, scanners, and inspection tools. In addition, acidic gases have also been shown to reduce the life of masks and reticles, decrease fuel cell output due to catalyst poisoning, and cause hard disk drive crashes due to surface contamination and corrosion. Consequently, acid gas control in these applications has become a critical part of the required filtration system. SOx concentrations are typically used as the baseline for acid gas filter exposure guidelines and performance testing. However, this approach has been shown to provide poor filter life predictions, which has been attributed to the presence of other acidic and organic contaminants that compete with SOx for the available adsorption sites. Equally important, the type of sorbents and methods used to control acid gases can significantly affect the ability to remove SOx. In this work we will compare the performance of various sorbents, structures, and methods for the removal of SOx and NOx.

[1]  Jinwon Park,et al.  Surface Chemical Characterization Using AES/SAM and ToF-SIMS on KOH-Impregnated Activated Carbon by Selective Adsorption of NOx , 2001 .

[2]  Jinwon Park,et al.  Performance of fixed-bed KOH impregnated activated carbon adsorber for NO and NO2 removal in the presence of oxygen , 2002 .

[3]  Y. Korai,et al.  Mechanistic study on adsorption and reduction of NO2 over activated carbon fibers , 2002 .

[4]  Jinwon Park,et al.  Characteristics of NO x adsorption and surface chemistry on impregnated activated carbon , 2002 .

[5]  Kaustuve Bhattacharyya,et al.  Reticle surface contaminants and their relationship to subpellicle particle formation , 2003, SPIE Photomask Technology.

[6]  Jian Zhou,et al.  Protecting the head/disk interface from the chemical environment with disk drive filtration , 2003 .

[7]  Jinwon Park,et al.  Adsorption and reaction behavior for the simultaneous adsorption of NO–NO2 and SO2 on activated carbon impregnated with KOH , 2003 .

[8]  Roel Gronheid,et al.  In-line monitoring of acid and base contaminants at low ppt levels for 193nm lithography , 2004, SPIE Advanced Lithography.

[9]  Andrew J. Dallas,et al.  New concerns with the design of filters for the protection of lithography optics , 2003, SPIE Advanced Lithography.

[10]  D. Choi,et al.  NOx adsorption–temperature programmed desorption and surface molecular ions distribution by activated carbon with chemical modification , 2004 .

[11]  Andrew J. Dallas,et al.  Are ambient SO2 levels a valid indicator of projected acid gas filter life? , 2004, SPIE Advanced Lithography.