Generation and self-replication of monolithic, dual-scale polymer structures by two-step capillary-force lithography.

Inhibition effects in UV radiation curing by oxygen were utilized for fabricating monolithic, micro/nanoscale hierarchical polymer structures via two-step UVassisted capillary force lithography (CFL). It was found that the UV exposure time for the partial curing of microstructure was a crucial parameter; a shorter exposure time induced collapse of the underlying microstructure while a longer time gave rise to non-fluidity of the microstructure. The partial curing is attributed to inhibition of UV crosslinking by trapped or permeated oxygen within mold cavities. Using this method, various dual-scale hierarchical structures were fabricated with minimum resolution to 50 nm over a large area (5×5 cm 2 ) in a fast and reproducible manner.

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