RF MEMS capacitive switch with leaky nanodiamond dielectric film

Abstract RF MEMS capacitive switches using leaky nanodiamond as a dielectric film are studied and compared with those using Si3N4. Characteristics of dielectric charging and discharging are analyzed at temperature ranging from − 196 °C to 150 °C. Electrical resistivity of leaky nanodiamond is measured to be lower than that of Si3N4 by 3 to 6 orders of magnitude at room temperature. Trapped charges in leaky nanodiamond dielectric discharge much more quickly than those in Si3N4 while the power dissipation of nanodiamond based switches remains low. As a result, charge trapping induced shift in electrostatic actuation voltage is greatly reduced compared to that with Si3N4 and becomes non-detectable under the reported conditions. RF MEMS capacitive switches based on leaky nanodiamond dielectric are, therefore, more reliable than those with Si3N4.

[1]  Zhen Peng,et al.  A transient SPICE model for dielectric-charging effects in RF MEMS capacitive switches , 2006, IEEE Transactions on Electron Devices.

[2]  Stepan Lucyszyn,et al.  Three-Dimensional RF MEMS Switch for Power Applications , 2009, IEEE Transactions on Industrial Electronics.

[3]  Luis Castañer,et al.  Modeling and measuring transient discharge current of microelectromechanical switches after dielectric charging by voltage stress , 2009 .

[4]  I. Lin,et al.  Low temperature growth of ultrananocrystalline diamond film and its field emission properties , 2006 .

[5]  L. Colombo,et al.  On the electrical activity of sp2-bonded grain boundaries in nanocrystalline diamond , 1999 .

[6]  Milos Nesladek,et al.  Growth, electronic properties and applications of nanodiamond , 2008 .

[7]  Patrick Pons,et al.  Voltage and temperature effect on dielectric charging for RF-MEMS capacitive switches reliability investigation , 2008, Microelectron. Reliab..

[8]  I. Lin,et al.  Effects of hydrogen additive on microwave plasma CVD of nanocrystalline diamond in mixtures of argon and methane , 2004 .

[9]  Hidemi Ishiuchi,et al.  An intelligent bipolar actuation method with high stiction immunity for RF MEMS capacitive switches and variable capacitors , 2007 .

[10]  John L. Volakis,et al.  Robust Design of RF-MEMS Cantilever Switches Using Contact Physics Modeling , 2009, IEEE Transactions on Industrial Electronics.

[11]  I. Lin,et al.  Growth of microcrystalline and nanocrystalline diamond films by microwave plasmas in a gas mixture of 1% methane/5% hydrogen/94% argon , 2004 .

[12]  Nora Finch,et al.  Design of A Novel Bulk Micro-machined RF MEMS Switch , 2002 .

[13]  Seeding, growth and characterization of nanocrystalline diamond films on various substrates , 2006 .

[14]  N. Lobontiu Mechanics of microelectromechanical systems , 2004 .

[15]  Y. Lai,et al.  Investigation of Structures of Microwave Microelectromechanical-System Switches by Taguchi Method , 2007 .

[16]  Yeong-Lin Lai,et al.  Design of electrostatically actuated MEMS switches , 2008 .

[17]  Rui F. Silva,et al.  Nano- and micro-crystalline diamond growth by MPCVD in extremely poor hydrogen uniform plasmas , 2007 .

[18]  Benno Margesin,et al.  Electromechanical characterization of low actuation voltage RF MEMS capacitive switches based on DC CV measurements , 2007 .

[19]  Ryutaro Maeda,et al.  Development of hafnium oxynitride dielectrics for radio-frequency-microelectromechanical system capacitive switches , 2007 .

[20]  Yeong-Lin Lai,et al.  Characteristics of Radio-Frequency Microelectromechanical-System Switches for Communication Systems , 2007 .

[21]  S. Eshelman,et al.  Micromachined low-loss microwave switches , 1999 .

[22]  M. Nagatsu,et al.  Characteristics of nano-crystalline diamond films prepared in Ar/H2/CH4 microwave plasma , 2007 .

[23]  C. Goldsmith,et al.  Acceleration of Dielectric Charging in RF MEMS Capacitive Switches , 2006, IEEE Transactions on Device and Materials Reliability.

[24]  Patrick Pons,et al.  Structure dependent charging process in RF MEMS capacitive switches , 2007, Microelectron. Reliab..

[25]  I. Tekin,et al.  Diamond semiconductor technology for RF device applications , 2005 .

[26]  Y. Tzeng,et al.  Diamond CVD by microwave plasmas in argon-diluted methane without or with 2% hydrogen additive , 2005 .