A liquid-xenon-jet laser-plasma x-ray and EUV source
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[1] G. G. Stokes. "J." , 1890, The New Yale Book of Quotations.
[2] J. Wyart,et al. Identification of Highly-Ionized Xenon Spectra (Xe XXVI Through XXXI) Excited in the Plasma of the TFR Tokamak , 1985 .
[3] Yabe,et al. Atomic-number dependence of soft-x-ray emission from various targets irradiated by a 0.53- microm-wavelength laser. , 1986, Physical review. A, General physics.
[4] B. Saoutic,et al. Highly ionized xenon spectra (95-260 Å) excited in TFR tokamak plasmas , 1988 .
[5] C. Bishop,et al. Proceedings of the 17th Symposium on Fusion Technology , 1992 .
[6] Hans M. Hertz,et al. Droplet target for low-debris laser-plasma soft X-ray generation , 1993 .
[7] H. M. Hertz,et al. Debris elimination in a droplet‐target laser‐plasma soft x‐ray source , 1995 .
[8] H. Ryssel,et al. Modification of field emitter array tip shape by focused ion‐beam irradiation , 1996 .
[9] Hans M. Hertz,et al. Liquid-jet target for laser-plasma soft x-ray generation , 1996 .
[10] David E. Seeger. Emerging lithographic technologies : 10-11 March 1997, Santa Clara, California , 1997 .
[11] Hans M. Hertz,et al. Cryogenic liquid-jet target for debris-free laser-plasma soft x-ray generation , 1998 .
[12] R. H. Stulen,et al. Extreme ultraviolet lithography , 1998 .
[13] Hans M. Hertz,et al. A slit grating spectrograph for quantitative soft x-ray spectroscopy , 1999 .
[14] John Heaton,et al. Using X-ray Lithography to make sub 100 nm MMICs , 2000 .
[15] Jos Benschop,et al. Comparison of Extreme Ultraviolet Sources for Lithography Applications , 2000 .