论文信息 - Properties of Si:H thin films deposited by rf-PECVD of silane–argon mixtures with variation of the plasma condition - 字舞流文

Properties of Si:H thin films deposited by rf-PECVD of silane–argon mixtures with variation of the plasma condition

P. Ray | P. Chaudhuri | C. Longeaud | D. L. Williamson | N. D. Gupta | S. Vignoli | P. Chaudhuri | D. Williamson