The diffusion of water into silica glass is modeled to result from the diffusion of molecular water into the glass and its reaction with the silicon-oxygen network to form SiOH groups. Equations for this diffusion-reaction mechanism are presented and compared with experimental diffusion profiles. At temperatures above about 500 °C the reaction goes to equilibrium, but at lower temperatures it does not, leading to a time dependence of the concentration of surface-reacted OH groups and of their apparent diffusion coefficient. At higher temperatures, the OH groups are nearly immobile, but diffuse far enough to sample neighboring OH groups, leading to a bimolecular reverse reaction. At lower temperatures only OH pairs react, giving a first-order reaction. When water tagged with O 18 diffuses into silica, the O 18 exchanges with O 16 in the silicon-oxygen network of the glass. This process is also controlled by the rate of diffusion of molecular water into the glass, and the rate of O 18 -O 16 exchange. This diffusion-reaction mechanism gives a unified description of the diffusion of water in silica glass from 160 °C to 1200 °C at least.
[1]
Minoru Tomozawa,et al.
Diffusion of Water into Silica Glass at Low Temperature
,
1989
.
[2]
R. Doremus,et al.
Hydrogen profiles in water-oxidized silicon
,
1976
.
[3]
M. Tomozawa.
Concentration Dependence of the Diffusion Coefficient of Water in SiO2 Glass
,
1985
.
[4]
J. C. Jaeger,et al.
Conduction of Heat in Solids
,
1952
.
[5]
G. Wasserburg,et al.
Diffusion of water in rhyolitic glasses.
,
1991,
Geochimica et cosmochimica acta.
[6]
B. Agius,et al.
An 18O Study of Cooperative Diffusion and Chemical Reaction during Thermal Treatments of Silica Films in Water Vapor
,
1982
.
[7]
H. Jain.
Diffusion in Amorphous Materials
,
1994
.
[8]
A. J. Moulson,et al.
Water in silica glass
,
1961
.
[9]
M. Ohring,et al.
Network oxygen exchange during water diffusion in SiO2
,
1981
.