A microfabricated inductively coupled plasma generator

The design, fabrication, and characterization of a surface micromachined plasma generator is described for the first time in this paper. The plasma is sustained without electrodes by inductively coupling a /spl sim/150-MHz current into a region of low-pressure gas, Both argon and air plasmas have been generated over a range of gas pressures from 0.1 to 10 torr (13.3-1333 Pa). Typically, the power used to sustain the plasma is 350 mW, although /spl sim/1.5 W is required to initiate the discharge. Network analysis of the plasma generator circuit shows that over 99% of the applied RF power can be absorbed by the device. Of this, /spl sim/50% is absorbed by the plasma and the remainder of the power is dissipated as ohmic heating. An argon ion current of up to 4.5 mA/cm/sup 2/ has been extracted from the plasma and the electron temperature is 52 000 K at 0.1 torr. This plasma source is intended for electronic excitation of gas samples so that the presence of impurities and toxins may be detected using optical emission spectroscopy.

[1]  A. Lichtenberg,et al.  Principles of Plasma Discharges and Materials Processing , 1994 .

[2]  Sanborn C. Brown,et al.  Basic Data of Plasma Physics , 1961 .

[3]  Siegfried W. Janson,et al.  Microtechnology for space systems , 1998, 1998 IEEE Aerospace Conference Proceedings (Cat. No.98TH8339).

[4]  R. Woods,et al.  A study of the accuracy of various Langmuir probe theories , 1994 .

[5]  Aaas News,et al.  Book Reviews , 1893, Buffalo Medical and Surgical Journal.

[6]  G. H. Vickers,et al.  Characterisation of a 9-mm torch for inductively coupled plasma mass spectrometry , 1990 .

[7]  R. Caloi,et al.  Getters and gettering in plasma display panels , 1998 .

[8]  Y. Yin,et al.  Miniaturization of inductively coupled plasma sources , 1999 .

[9]  R. Rechenmacher,et al.  Pan-da And Beyond Data Acquisition For the Next Generation Experiments , 1991, Seventh Conference Real Time '91 on Computer Applications in Nuclear, Particle and Plasma Physics Conference Record.

[10]  Jeffrey Hopwood,et al.  Review of inductively coupled plasmas for plasma processing , 1992 .

[11]  G. D. Alley Interdigital Capacitors and Their Application to Lumped-Element Microwave Integrated Circuits , 1970 .

[12]  Benjamin Alexandrovich,et al.  A simple analysis of an inductive RF discharge , 1992 .

[13]  Y. Yin,et al.  Fabrication and characterization of a micromachined 5 mm inductively coupled plasma generator , 2000 .

[14]  G. Petzold,et al.  Surface microstructure/miniature mass spectrometer:.processing and applications , 1998 .

[15]  Paul L. Kelley,et al.  Micromachined scanning Fabry-Perot interferometer , 1998, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.