Low temperature direct bonding mechanisms of tetraethyl orthosilicate based silicon oxide films deposited by plasma enhanced chemical vapor deposition
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Laurent Vandroux | C. Sabbione | L. Di Cioccio | Francois Rieutord | L. Vandroux | J. Nieto | F. Rieutord | L. Cioccio | J.-P. Nieto | C. Sabbione
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