Structural and photoluminescent properties of TiN thin films

Structural and photoluminescent properties of TiN thin films deposited by dc reactive magnetron sputtering are studied. It is found that TiN thin films are polycrystalline with a grain size of ∼15 nm and have a NaCl-type cubic crystal structure with a lattice constant of 0.42 nm. The TiN films under study exhibit photoluminescence in the spectral range hν ≈ 2.1–3.4 eV at 300 K.

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