论文信息 - Low cost nanolithography with nanoaccuracy

Low cost nanolithography with nanoaccuracy

Abstract Because many applications of lithography cannot use the optical projection tools developed for the semiconductor industry, either because of high cost or inflexibility, low-cost, flexible alternatives are essential to research and future industries. A subset of these low-cost alternatives is discussed: intimate-contact lithography, interference lithography, and spatial-phase-locked e-beam lithography. It is asserted that self assembly, an important element of future nanotechnology, will likely utilize lithography in so-called “templated self-assembly”.

Henry I. Smith | Henry I. Smith

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