论文信息 - Optical and structural properties of SiOx and SiNx materials

Optical and structural properties of SiOx and SiNx materials

Abstract SiOx and SiNx films with varied stoichiometries were obtained by low-pressure chemical vapor deposition at low temperature from Si 2 H 6 N 2 O and Si 2 H 6 NH 3 gas mixtures respectively. Using the Clausius-Mossoti theory and the Bruggeman expression, a relation between the refractive index and the stoichiometry of these two materials is established and corroborated by experiments thanks to X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, electron energy loss spectroscopy or/and the differential thickness method. These data have also been correlated in order to calculate the electronic polarizability of silicon atoms into SiOx and SiNx materials.

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