The evaluation of thin film insulators

Abstract Due to the importance of thin film insulators for diffusion masking, crossover insulation, and for surface passivation of semiconductor devices, a great deal of interest in glass and oxide films has been generated. To evaluate and compare various glass films with regard to composition, structure, and water and chemical stability, a combination of optical and spectroscopic techniques have been used. No one technique in itself is sufficient for the evaluation of thin glass films, but from a combination of these techniques a great deal about the composition, structure, and stability of the films can be learned. The evaluations include the effect on the film properties of various treatments such as thermal annealing and densification, high humidity and temperature, etching, etc. The use of these techniques will be discussed in detail. Comparisons will be made among insulating films formed by r.f. sputtering, fusing sedimented glass, pyrolysis, electron-gun evaporation, and thermally grown silicon dioxide.