Application of a new approach to optical proximity correction
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Wolfram Ziegler | Patrick Schiavone | Olivier Toublan | Carmelo Romeo | Wilhelm Maurer | Tom Vermeulen | Anja Rosenbusch | Rainer Zimmermann | Andrew C. Hourd | Casper A. H. Juffermans | Hartmut Kirsch | Frederic P. Lalanne | Kurt G. Ronse | Michal Simecek | John G. Watson
[1] Wolfram Ziegler,et al. Assessment of corner-rounding improvement by automatic software correction on laser pattern generator manufactured photomasks , 1998, Photomask Technology.
[2] Brian Martin,et al. Full-chip optical proximity correction using lithography simulation , 1998, Photomask Technology.