Fully automated, fixed exit, in vacuum double-multilayer monochromator for synchrotron-based hard X-ray micro-imaging applications

We present a double multilayer monochromator (DMM) design which has been realized for the BAMline (BESSY‐II light source, Germany) as well as in an updated version for the TopoTomo beamline (ANKA light source. Germany) [1–4]. The latter contains two pairs of multilayer stripes in order to avoid absorption edges of the coating material. For both DMMs, the second multilayer offers a meridional bending option for beam compression to increase the available photon flux density. Each multilayer mirror is equipped with a vertical stage for height adjustments allowing for compensation of varying incoming beam heights and giving a certain flexibility choosing the offset. The second multilayer can be moved in the beam direction in order to cover the full energy range available. Furthermore, a white beam option is available.