VUV laser (157 nm) chemical vapor deposition of high quality amorphous hydrogenated silicon: gas phase chemistry and modelling
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P. Hess | J. Knobloch | A. Winkler | A. Pusel | M. Barth | H. Karstens
[1] Y. Hishikawa,et al. Principles for controlling the optical and electrical properties of hydrogenated amorphous silicon deposited from a silane plasma , 1993 .
[2] T. Shirafuji,et al. Direct Photochemical Vapor Deposition of Hydrogenated Amorphous Silicon -Effects of Excitation Wavelengths and Source Gases- , 1993 .
[3] J. J. Pedroviejo,et al. Silicon deposited by low pressure chemical vapour deposition from Si2H6: experiments, modelling and properties , 1993 .
[4] P. Hess,et al. Chemical vapour deposition of amorphous hydrogenated silicon with a CO2 laser: chemical mechanism , 1992 .
[5] Isaac Balberg,et al. Deposition of device quality, low H content amorphous silicon , 1991 .
[6] D. R. Scheuing. Fourier Transform Infrared Spectroscopy in Colloid and Interface Science , 1990 .
[7] J. Perrin,et al. Temperature dependence of the sticking and loss probabilities of silyl radicals on hydrogenated amorphous silicon , 1990 .
[8] Alan Gallagher,et al. Production of high-quality amorphous silicon films by evaporative silane surface decomposition , 1988 .
[9] T. Fuyuki,et al. Deposition of high‐quality a‐Si:H by direct photodecomposition of Si2H6 using vacuum ultraviolet light , 1988 .
[10] R. Walsh,et al. Mechanism of formation of tri- and tetrasilane in the reaction of atomic hydrogen with monosilane and the thermochemistry of the disilene isomers , 1987 .
[11] D. Adler,et al. Laser‐induced chemical vapor deposition of hydrogenated amorphous silicon. II. Film properties , 1987 .
[12] K. Tachibana,et al. On the Reaction Kinetics in a Mercury Photosensitized CVD of a-Si:H Films , 1987 .
[13] Yasutake Toyoshima,et al. Vacuum ultraviolet absorption cross sections of SiH4, GeH4, Si2H6, and Si3H8 , 1986 .
[14] R. Robertson,et al. Reaction mechanism and kinetics of silane pyrolysis on a hydrogenated amorphous silicon surface , 1986 .
[15] M. Cardona. Vibrational Spectra of Hydrogen in Silicon and Germanium , 1983 .
[16] Digby F. Williams,et al. Dependence of the microstructure of amorphous silicon thin films prepared by planar rf magnetron sputtering on deposition parameters , 1983 .
[17] R. Ross,et al. Microstructure and properties of rf‐sputtered amorphous hydrogenated silicon films , 1981 .
[18] F. W. Lampe,et al. 147-nm photolysis of disilane , 1980 .
[19] M. Hirose,et al. Hydrogen Implantation into CVD Amorphous Silicon , 1980 .