Laser chemical vapour deposition: materials, modelling, and process control
暂无分享,去创建一个
[1] H. Bergh,et al. High‐speed laser chemical vapor deposition of copper: A search for optimum conditions , 1989 .
[2] H. Westberg,et al. Laser-induced chemical vapour deposition of TiSi2: Aspects of deposition process, microstructure and resistivity , 1991 .
[3] Stefan Johansson,et al. Free‐standing silicon microstructures fabricated by laser chemical processing , 1993 .
[4] V. Hopfe,et al. IR-laser CVD of TiB2, TiCx and TiCxNy coatings on carbon fibres , 1992 .
[5] R. Jackson,et al. Laser‐induced chemical vapor deposition of aluminum , 1989 .
[6] S. Kishida,et al. Thick gold-film deposition by high-repetition visible pulsed-laser chemical vapor deposition , 1994 .
[7] H. Suhr,et al. Laser induced CVD of gold using new precursors , 1992 .
[8] F. Wallenberger,et al. Strong, Pure, and Uniform Carbon Fibers Obtained Directly from the Vapor Phase , 1993, Science.
[9] S. Allen,et al. Experimental determination of laser heated surface temperature distributions , 1987 .
[10] H. Reichl,et al. Laser direct writing of gold to repair defective lines in thin-film metallizations , 1993 .
[11] L. S. Nelson,et al. Formation of thin rods of pyrolytic carbon by heating with a focused carbon dioxide laser , 1972 .
[12] B. Robertson,et al. Chemical vapor deposition precursor chemistry. 5. The photolytic laser deposition of aluminum thin films by chemical vapor deposition , 1996 .
[13] K. Jensen,et al. Combined experimental and modeling studies of laser‐assisted chemical vapor deposition of copper from copper(I)‐hexafluoroacetylacetonate trimethylvinylsilane , 1994 .
[14] F. Wallenberger. Inorganic fibres and microfabricated parts by laser assisted chemical vapour deposition (LCVD) : Structures and properties , 1997 .
[15] J. Nieuwkoop,et al. CO2-laser-induced chemical vapour deposition of TiB2 , 1991 .
[16] Olaf Lehmann,et al. Laser-Driven Movement of Three-Dimensional Microstructures Generated by Laser Rapid Prototyping , 1995, Science.
[17] K. Piglmayer,et al. On the reaction kinetics in laser-induced pyrolytic chemical processing , 1990 .
[18] Ricardo Izquierdo,et al. Laser direct writing of tungsten from WF6 , 1992 .
[19] J. Elders,et al. Laser‐induced chemical vapor deposition of titanium diboride , 1994 .
[20] James F. Gibbons,et al. Laser and electron-beam solid interactions and materials processing : proceedings of the Materials Research Society Annual Meeting, November 1980, Copley Plaza Hotel, Boston, Massachusetts, U.S.A. , 1981 .
[21] U. Kempfer,et al. New types of periodic structures in laser-induced chemical vapor deposition , 1986 .
[22] R. Kant,et al. Laser-Induced Heating of a Multilayered Medium Resting on a Half-Space: Part I—Stationary Source , 1988 .
[23] T. Kodas,et al. Real time optical profilometry as a probe of rates of laser‐induced chemical vapor deposition , 1987 .
[24] R. Salathé,et al. Laser generated microstructures , 1985 .
[25] F. Wallenberger,et al. Amorphous silicon nitride fibers grown from the vapor phase , 1994 .
[26] D. Bäuerle,et al. Lateral growth rates in laser CVD of microstructures , 1984 .
[27] C. Lavoie,et al. Modeling KrF excimer laser induced deposition of titanium from titanium tetrachloride , 1992 .
[28] R. Ebert,et al. Laser-induced chemical vapour deposition of conductive and insulating thin films , 1992 .
[29] D. Bäuerle,et al. Kr+ laser‐induced chemical vapor deposition of W , 1987 .
[30] J. Wilson,et al. Morphological and structural changes in laser CVD of silicon: comparison of theoretical temperature calculations with experimental results , 1989 .
[31] F. Houle,et al. In situ Fourier transform infrared spectroscopy and stochastic modeling of surface chemistry of amorphous silicon growth , 1998 .
[32] W. Sinke,et al. Excimer laser induced deposition of tungsten on silicon , 1989 .
[33] O. Lehmann,et al. Three-dimensional laser direct writing of electrically conducting and isolating microstructures , 1994 .
[34] P. Chen,et al. Atmospheric laser chemical vapour deposition of iron-carbon composites , 1995 .
[35] R. Salathé,et al. Efficient luminescence band created in (Al, Ga)As multilayers by athermal laser processing , 1981 .
[36] P. Lorenz,et al. Laser based chemical vapour deposition of titanium nitride coatings , 1994 .
[37] J. Mazumder,et al. Three-dimensional transient thermal analysis for laser chemical vapor deposition on uniformly moving finite slabs , 1989 .
[38] T. H. Baum,et al. Laser-induced chemical vapor deposition of metals for microelectronics technology , 1992 .
[39] R. Salathé,et al. Laser-Initiated Metal-Deposition on Gaas Substrates , 1981 .
[40] M. Boman,et al. Inorganic fibers and microstructures directly from the vapor phase , 1994 .
[41] Melvin Lax,et al. Temperature rise induced by a laser beam , 1977 .
[42] L. O'connor. Developing bigger micromachines , 1996 .
[43] M. Boman,et al. Laser-assisted chemical vapor deposition of hard and refractory binary compounds , 1991 .
[44] G. Wahl,et al. Simulation of laser CVD , 1990 .
[45] J. Elders,et al. Laser-induced CVD of titanium diboride and the influence of atomic hydrogen , 1993 .
[46] S. Allen,et al. Real time measurement of deposition initiation and rate in laser chemical vapor deposition , 1985 .
[47] James L. Maxwell,et al. Real-time volumetric growth rate measurements and feedback control of three-dimensional laser chemical vapor deposition , 1998 .
[48] Daniel Braichotte,et al. The photolytic laser chemical vapor deposition rate of platinum, its dependence on wavelength, precursor vapor pressure, light intensity, and laser beam diameter , 1990 .
[49] F. Wallenberger. Rapid Prototyping Directly from the Vapor Phase , 1995, Science.
[50] Mats Boman,et al. Kinetics in thermal laser-assisted chemical vapour deposition of titanium carbide , 1992 .
[51] D. Bäuerle,et al. Laser induced chemical vapor deposition of carbon , 1981 .
[52] S. Allen,et al. Laser chemical vapor deposition of selected area Fe and W films , 1983 .
[53] S. Bedair,et al. Low temperature selective epitaxy of III V compounds by laser assisted chemical vapor deposition , 1988 .
[54] R. Hendel,et al. Temperature profiles induced by a scanning cw laser beam , 1982 .
[55] J. Mazumder,et al. In situ laser‐induced fluorescence studies of laser chemical vapor deposition of TiN thin films , 1994 .
[56] K. Mutoh,et al. Soft‐x‐ray multilayer mirrors with laterally varying film thicknesses fabricated using laser‐beam‐scanning chemical vapor deposition , 1995 .
[57] T. R. Anthony,et al. Heat treating and melting material with a scanning laser or electron beam , 1977 .
[58] M. Wanke,et al. Laser Rapid Prototyping of Photonic Band-Gap Microstructures , 1997, Science.
[59] Robby Ebert,et al. Titanium nitride thin film deposition by laser CVD , 1996 .
[60] W. Sinke,et al. Kinetics of excimer-laser induced CVD of W , 1992 .
[61] A. Lecours,et al. Laser-induced damaged formation and tungsten deposition on GaAs , 1992 .
[62] Stefan Johansson,et al. Microfabrication of three-dimensional boron structures by laser chemical processing , 1992 .
[63] Yushu Zhang,et al. Theoretical study on the fabrication of a microlens using the excimer laser chemical vapor deposition technique , 1996 .
[64] F. Houle,et al. Laser chemical vapor deposition of copper , 1985 .
[65] Jogender Singh,et al. Laser‐enhanced synthesis and processing of diamond films from liquid hydrocarbons , 1993 .
[66] John C. Roberts,et al. Direct writing of GaAs optical waveguides by laser‐assisted chemical vapor deposition , 1996 .
[67] F. Wallenberger,et al. Strong, small diameter, boron fibers by LCVD , 1992 .
[68] T. Rantala,et al. A numerical simulation method for the laser‐induced temperature distribution , 1989 .
[69] D. Bäuerle,et al. Rapid Determination of Apparent Activation Energies in Chemical Vapor Deposition , 1983 .
[70] H. Marcus,et al. Design of a Closed Loop Computer Controlled System for Selective Area Laser Deposition. I. Laser Systems, Gasflow, and Substrate Temperature Control , 1996 .
[71] K. K. Yee. Protective coatings for metals by chemical vapour deposition , 1978 .
[72] T. H. Baum,et al. LCVD of copper: Deposition rates and deposit shapes , 1986 .
[73] O. Lehmann,et al. Generation of three-dimensional free-standing metal micro-objects by Laser Chemical processing , 1991 .
[74] D. N. Mashburn,et al. Low temperature photon-controlled growth of thin films and multilayered structures , 1989 .
[75] J. Wilson,et al. Laser writing of high-purity gold lines , 1989 .
[76] P. Molian,et al. Laser chemical vapor deposition of fluorinated diamond thin films for solid lubrication , 1993 .
[77] T. Kodas,et al. Surface temperature rise in multilayer solids induced by a focused laser beam , 1987 .
[78] J. Mazumder,et al. Kinetic studies of laser chemical vapor deposition of titanium nitride , 1994 .
[79] W. J. Lackey,et al. Ceramic coatings for advanced heat engines - A review and projection , 1987 .
[80] J. Elders,et al. Photochemical vapor deposition of titaniumdiboride , 1990 .
[81] V. Shanov,et al. Laser‐induced chemical vapor deposition of aluminum from trimethylamine alane , 1994 .
[82] G. Haidemenopoulos,et al. Pyrolytic laser-based chemical vapour deposition of TIC coatings , 1995 .
[83] S. Bedair,et al. Laser selective deposition of GaAs on Si , 1986 .
[84] D. Tonneau,et al. Kinetics of laser thermal decomposition of trimethylamine alane , 1995 .
[85] M. Pérez-Amor,et al. Amorphous germanium layers prepared by UV-photo-induced chemical vapour deposition , 1996 .
[86] Susan D. Allen,et al. Laser chemical vapor deposition: A technique for selective area deposition , 1981 .
[87] A. J. Silvestre,et al. Structure and morphology of titanium nitride films deposited by laser-induced chemical vapour deposition , 1994 .
[88] A. J. Silvestre,et al. CO2 laser induced CVD of TiN , 1992 .
[89] S. Boughaba,et al. Deposition of micron-size nickel lines by argon-ion laser-assisted decomposition of nickel tetracarbonyl , 1993 .
[90] H. Bergh,et al. Growth rates and electrical conductivity of microscopic ohmic contacts fabricated by laser chemical vapor deposition of platinum , 1987 .
[91] S. Allen,et al. Summary Abstract: Properties of several types of films deposited by laser CVD , 1982 .
[92] G. Higashi. The chemistry of alkyl-aluminum compounds during laser-assisted chemical vapor deposition , 1989 .
[93] A. J. Silvestre,et al. Investigation of the microstructure, chemical composition and lateral growth kinetics of TiN films deposited by laser-induced chemical vapour deposition , 1994 .
[94] Arunava Gupta,et al. CO2 laser‐induced chemical vapor deposition of titanium silicide films , 1985 .
[95] K. Jensen,et al. Pyrolytic laser assisted chemical vapor deposition of Al from dimethylethylamine‐alane: Characterization and a new two‐step writing process , 1994 .