论文信息 - Magnetron Dry Etching for Photonic Device Fabrication - 字舞流文

Magnetron Dry Etching for Photonic Device Fabrication

Hans Zappe | R. Widmer | Hans W. Lehmann | J. E. Epler | J. Epler | H. Zappe | H. Lehmann | R. Widmer | H. E. G. Arnot | B. Graf | H. Arnot | B. Graf

[1] A. Ketterson,et al. A comparative study of wet and dry selective etching processes for GaAs/AIGaAs/lnGaAs pseudomorphic MODFETs , 1992 .

[2] SiCl 4 reactive ion etching for GaAs optical waveguides , 1985 .

[3] I. Lin. Steady‐state rf magnetron discharges , 1985 .

[4] R. H. Williams,et al. Reactive ion etching induced damage in GaAs and Al0.3Ga0.7As using SiCl4 , 1992 .

[5] T. Matsui,et al. GaInAsP/InP mass transport laser monolithically integrated with photodetector using reactive ion etching , 1989 .

[6] K. L. Seaward,et al. Semiconductor damage from inert and molecular gas plasmas , 1992 .