Mechanophotopatterning on a Photoresponsive Elastomer

IC A IO N The fabrication of well-defi ned topographical features or textures is a dynamic area of research owing to their extraordinary potential in applications ranging from complex optics to tunable and responsive surfaces. [ 1–6 ] Here, mechanophotopatterning (MPP) on a photoresponsive elastomer is introduced and enables for the fi rst time the ability to precisely and simultaneously manipulate both material shape and surface topography by exposure to light without the need for solvents, molding, or physical contact. MPP is a unique patterning approach whereby deformation is applied to an elastomeric material capable of photoinduced structural modifi cation to alter its equilibrium geometry, elegantly complementing previous mechanically assisted patterning techniques. [ 7–9 ] This material responds to MPP by continuously and locally deforming via polymer network connectivity rearrangement, which enables 3D control of its geometry. Unlike conventional photolithographic approaches, MPP forgoes any wet chemistry or surface deposition/modifi cation processing and simplifi es multi-tiered feature fabrication. Furthermore, in contrast with mechanically assisted patterning techniques that utilize buckling phenomena, [ 4 , 8 , 9 ]