Nanostructuring of chalcogenide glasses using electron beam lithography

We have investigated nanostructuring capabilities of As-S chalcogenide glasses using electron beam lithography. After exposure to electron beam the thin films of these inorganic glasses can be etched in alkaline amine solvent with high selectivity. Dissolution rate is linearly proportional to the electron dose and Gaussian electron beam intensity profile is well replicated in the shape of individual lines. High resolution smooth, shaped nanostructures have been fabricated in chalcogenide thin films with dimensions well below 100 nm and aspect ratio about 3.