Enhanced performance of vertical GaN-based LEDs with a highly reflective ohmic contact and a nano-roughened indium-zinc oxide transparent conduction layer
暂无分享,去创建一个
[1] Michael R. Krames,et al. High-power AlGaInN flip-chip light-emitting diodes , 2001 .
[2] Chii-Chang Chen,et al. Light enhancement by the formation of an Al oxide honeycomb nanostructure on the n-GaN surface of thin-GaN light-emitting diodes , 2007 .
[3] Patterning Periodical Motif on Substrates Using Monolayer of Microspheres: Application in GaN Light-Emitting Diodes , 2009 .
[4] Eicke R. Weber,et al. Structural and optical quality of GaN/metal/Si heterostructures fabricated by excimer laser lift-off , 1999 .
[5] Yu-Cheng Lin,et al. High power nitride based light emitting diodes with Ni/ITO p-type contacts , 2003 .
[6] A. Danner,et al. Fabrication of Efficient Light-Emitting Diodes With a Self-Assembled Photonic Crystal Array of Polystyrene Nanoparticles , 2008, IEEE Photonics Technology Letters.
[7] N. Cheung,et al. Fabrication of thin-film InGaN light-emitting diode membranes by laser lift-off , 1999 .
[8] Shuji Nakamura,et al. Cone‐shaped surface GaN‐based light‐emitting diodes , 2005 .
[9] The use of transparent conducting indium-zinc oxide film as a current spreading layer for vertical-structured high-power GaN-based light-emitting diodes , 2006, IEEE Photonics Technology Letters.
[10] Shui-Jinn Wang,et al. Use of patterned laser liftoff process and electroplating nickel layer for the fabrication of vertical-structured GaN-based light-emitting diodes , 2005 .
[11] Jing Li,et al. III-nitride blue microdisplays , 2001 .