Separation of hydrogen from steam using a SiC-based membrane formed by chemical vapor deposition of triisopropylsilane

Abstract A silicon carbide-based membrane was formed in the macropores of an α -alumina support tube by chemical vapor deposition of triisopropylsilane at 700–800°C with a forced cross-flow through the porous wall. The membrane permeated gases except H 2 O mainly by the Knudsen diffusion mechanism at permeation temperatures of 50–400°C. The H 2 /H 2 O selectivity was near or below unity because of the hydrophilic nature of the membrane. After a heat-treatment in Ar at 1000°C for 1 h, however, the membrane formed at a final evacuation pressure of 1 kPa exhibited a H 2 /H 2 O selectivity of 3–5, for a mixed feed of H 2 –H 2 O–HBr system, associated in a thermochemical water-splitting process. The H 2 permeance was (5–6)×10 −7  mol m −2  s −1  Pa −1 at 50–400°C. The membrane maintained the H 2 /H 2 O selectivity for more than 100 h in the H 2 –H 2 O–HBr mixture at 400°C.

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