Electromigration Mechanism of Failure in Flip-Chip Solder Joints Based on Discrete Void Formation

[1]  J. E. Smee,et al.  Industry Perspective , 2017, IEEE Wirel. Commun..

[2]  Feng Xu,et al.  Study of electromigration-induced formation of discrete voids in flip-chip solder joints by in-situ 3D laminography observation and finite-element modeling , 2016 .

[3]  H. Proudhon,et al.  3D Damage Micromechanisms in Polyamide 6 Ahead of a Severe Notch Studied by In Situ Synchrotron Laminography , 2016 .

[4]  Changqing Liu,et al.  Perpendicular Growth Characteristics of Cu-Sn Intermetallic Compounds at the Surface of 99Sn-1Cu/Cu Solder Interconnects , 2015, Journal of Electronic Materials.

[5]  Subramanian S. Iyer,et al.  Three-dimensional integration: An industry perspective , 2015 .

[6]  Kuan-Neng Chen,et al.  Materials challenges in three-dimensional integrated circuits , 2015 .

[7]  Chih Chen,et al.  Temperature-dependent failure mechanism of SnAg solder joints with Cu metallization after current stressing: Experimentation and analysis , 2013 .

[8]  Lukas Helfen,et al.  Three-dimensional assessment of low velocity impact damage in particle toughened composite laminates using micro-focus X-ray computed tomography and synchrotron radiation laminography , 2013 .

[9]  Joris Dik,et al.  High-resolution non-invasive 3D imaging of paint microstructure by synchrotron-based X-ray laminography , 2013 .

[10]  감동근 Electronic Packaging 기술 동향 , 2013 .

[11]  K. Tu,et al.  Thermomigration in solder joints , 2012 .

[12]  Feng Xu,et al.  Comparison of image quality in computed laminography and tomography. , 2012, Optics express.

[13]  C. Kao,et al.  In situ observation of thermomigration of Sn atoms to the hot end of 96.5Sn-3Ag-0.5Cu flip chip solder joints , 2011 .

[14]  Feng Xu,et al.  Rapid diagnosis of electromigration induced failure time of Pb-free flip chip solder joints by high resolution synchrotron radiation laminography , 2011 .

[15]  J. Baruchel,et al.  On the implementation of computed laminography using synchrotron radiation. , 2011, The Review of scientific instruments.

[16]  P. Tafforeau,et al.  Three-Dimensional Pelvis and Limb Anatomy of the Cenomanian Hind-Limbed Snake Eupodophis descouensi (Squamata, Ophidia) Revealed by Synchrotron-Radiation Computed Laminography , 2011 .

[17]  Y. C. Chan,et al.  Growth mechanism of Ni3Sn4 in a Sn/Ni liquid/solid interfacial reaction , 2009 .

[18]  Y. Lai,et al.  Nonuniform and Negative Marker Displacements Induced by Current Crowding During Electromigration in Flip-Chip Sn-0.7Cu Solder Joints , 2009 .

[19]  E. Cayirci,et al.  Experimentation and Analysis , 2009 .

[20]  Yi-Shao Lai,et al.  Electromigration on void formation of Sn3Ag1.5Cu FCBGA solder joints , 2009, Microelectron. Reliab..

[21]  Ning-Cheng Lee,et al.  Achieving high reliability low cost lead-free SAC solder joints via Mn or Ce doping , 2009, 2009 59th Electronic Components and Technology Conference.

[22]  Chih Chen,et al.  Effect of bump size on current density and temperature distributions in flip-chip solder joints , 2009, Microelectron. Reliab..

[23]  Hsiang-Yao Hsiao,et al.  Thermomigration in Pb-free SnAg solder joint under alternating current stressing , 2009 .

[24]  Chih Chen,et al.  Electromigration in Sn–Cu intermetallic compounds , 2009 .

[25]  D. Frear,et al.  Secondary Current Crowding Effect during Electromigration of Flip-Chip Solder Joints , 2008 .

[26]  Chih Chen,et al.  Effect of void propagation on bump resistance due to electromigration in flip-chip solder joints using Kelvin structure , 2007 .

[27]  Alexander Rack,et al.  Synchrotron‐radiation computed laminography for high‐resolution three‐dimensional imaging of flat devices , 2007 .

[28]  Y. C. Chuang,et al.  Study of electromigration-induced Cu consumption in the flip-chip Sn∕Cu solder bumps , 2006 .

[29]  Shui-Jinn Wang,et al.  Current density dependence of electromigration-induced flip-chip Cu pad consumption , 2006 .

[30]  S. W. Liang,et al.  Study of void formation due to electromigration in flip-chip solder joints using Kelvin bump probes , 2006 .

[31]  King-Ning Tu,et al.  Effect of three-dimensional current and temperature distributions on void formation and propagation in flip-chip solder joints during electromigration , 2006 .

[32]  Tilo Baumbach,et al.  Investigation of hybrid pixel detector arrays by synchrotron-radiation imaging , 2006 .

[33]  Chih Chen,et al.  Critical length of electromigration for eutectic SnPb solder stripe , 2006 .

[34]  Y. L. Lin,et al.  Local melting induced by electromigration in flip-chip solder joints , 2006 .

[35]  Chih Chen,et al.  Redistribution of Pb-rich phase during electromigration in eutectic SnPb solder stripes , 2006 .

[36]  Chih Chen,et al.  Infrared microscopy of hot spots induced by Joule heating in flip-chip SnAg solder joints under accelerated electromigration , 2006 .

[37]  King-Ning Tu,et al.  Effect of current crowding on void propagation at the interface between intermetallic compound and solder in flip chip solder joints , 2006 .

[38]  King-Ning Tu,et al.  Relieving the current crowding effect in flip-chip solder joints during current stressing , 2006 .

[39]  Y. C. Chan,et al.  Solid-state growth kinetics of Ni3Sn4 at the Sn–3.5Ag solder∕Ni interface , 2005 .

[40]  K. Tu,et al.  Electromigration in Pb-free SnAg3.8Cu0.7 solder stripes , 2005 .

[41]  H. Yu,et al.  Study of electromigration in thin tin film using edge displacement method , 2005 .

[42]  Y. H. Lin,et al.  In situ observation of the void formation-and-propagation mechanism in solder joints under current-stressing , 2005 .

[43]  King-Ning Tu,et al.  Current-crowding-induced electromigration failure in flip chip solder joints , 2002 .

[44]  Glenn R. Blackwell,et al.  The electronic packaging handbook , 1999 .

[45]  K. Tu,et al.  Microstructure-electromigration correlation in a thin stripe of eutectic SnPb solder stressed between Cu electrodes , 1999 .

[46]  Chi Shih Chang,et al.  Future challenges in electronics packaging , 1998 .

[47]  K. Erickson,et al.  Solid state intermetallic compound growth between copper and high temperature, tin-rich solders—part II: Modeling , 1994 .

[48]  J. W. Morris,et al.  Analysis of low-temperature intermetallic growth in copper-tin diffusion couples , 1992 .

[49]  I. Blech Electromigration in thin aluminum films on titanium nitride , 1976 .

[50]  C. Wagner,et al.  THE EVALUATION OF DATA OBTAINED WITH DIFFUSION COUPLES OF BINARY SINGLE- PHASE AND MULTIPHASE SYSTEMS. , 1969 .

[51]  N. Chawla,et al.  Electromigration mechanisms in Sn-0.7Cu/Cu couples by four dimensional (4D) X-ray microtomography and electron backscatter diffraction (EBSD) , 2016 .

[52]  Patrick J. Quinn,et al.  Silicon Innovation Exploiting Moore Scaling and “More than Moore” Technology , 2015 .

[53]  P. Verboven,et al.  Synchrotron X-ray computed laminography of the three-dimensional anatomy of tomato leaves. , 2015, The Plant journal : for cell and molecular biology.

[54]  N. Chawla,et al.  Electromigration Damage Characterization in Sn-3.9Ag-0.7Cu and Sn-3.9Ag-0.7Cu-0.5Ce Solder Joints by Three-Dimensional X-ray Tomography and Scanning Electron Microscopy , 2013, Journal of Electronic Materials.

[55]  M. Osterman,et al.  iNEMI Pb-FREE ALLOY CHARACTERIZATION PROJECT REPORT : PART IV-EFFECT OF ISOTHERMAL PRECONDITIONING ON THERMAL FATIGUE LIFE , 2012 .

[56]  M. Osterman,et al.  iNEMI PB-FREE ALLOY CHARACTERIZATION PROJECT REPORT : PART III-THERMAL FATIGUE RESULTS FOR LOW-AG ALLOYS , 2012 .

[57]  K. Tu,et al.  Current density redistribution from no current crowding to current crowding in Pb-free solder joints with an extremely thick Cu layer , 2012 .

[58]  Nikhil Vishwanath Kelkar,et al.  Lead-Free and PbSn Bump Electromigration Testing , 2005 .

[59]  Chang-Da Tsai,et al.  Electromigration-induced failure in flip-chip solder joints , 2005 .

[60]  K. Tu Recent advances on electromigration in very-large-scale-integration of interconnects , 2003 .

[61]  T. Shao,et al.  Electromigration study in SnAg3.8Cu0.7 solder joints on Ti/Cr-Cu/Cu under-bump metallization , 2003 .