Microwave surface resistance in Tl‐based superconducting thin films

We report measurements of microwave surface resistance in Tl‐based superconductor thin films made by laser ablation followed by a post‐deposition thermal process. The films were measured by using cavity methods. The data at 9.5 and 148 GHz indicate that the residual resistance scales as f2. At 77 K, the 9.5 GHz surface resistance is ten times smaller than oxygen‐free high‐conductance copper at the same temperature and frequency. The 9.5 GHz measurement also indicates that the film‐substrate interface does not cause more microwave loss than the film surface.