Characteristics of a toroidal planar hollow cathode and its use for the preparation of Bi nanoparticles

Using ideas from the sputter deposition by gas flow hollow cathode (GFHC) we have designed a new version in the form of a toroidal planar hollow cathode. Here the flow of gas is used to entrain the sputtered atoms and nanoparticles formed by agglomeration in the gas phase, through the cathode central exit aperture towards the substrate. We have studied the characteristics of the deposit as a function of the applied pulsed dc electrical power, the argon gas pressure and flow. By varying the different operating parameters, such as pressure (6.7–267 Pa), power (40–120 W) and gas flow (20–140 sccm), it was possible to control the size of the nanoparticles (10–150 nm) and the deposition rate (0.4–4.0 nm min−1). We demonstrate that the nanoparticles are of crystalline bismuth, even though the cathode is made of graphite with small added pieces of bismuth.

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