Molecular nitrogen implanted in Al2O3 by low energy N2+ ion bombardment
暂无分享,去创建一个
[1] T. Chassé,et al. Interstitial nitrogen induced by low-energy ion beam nitridation of AIII–BV semiconductor surfaces , 2001 .
[2] T. Chassé,et al. In situ characterization of the nitridation of AIII–BV semiconductor surfaces by means of X-ray photoelectron spectroscopy , 2001 .
[3] I. Bertóti,et al. Surface chemical effects of low‐energy N2+ ion bombardment on single crystalline α‐Al2O3 , 2000 .
[4] M. Piancastelli. Auger resonant Raman studies of atoms and molecules , 2000 .
[5] J. Cazaux,et al. Mechanisms of charging in electron spectroscopy , 1999 .
[6] H. Ichimura,et al. Composition dependence of the initial oxidation behaviour of Ti1−xAlxN (x = 0.20, 0.45, 0.65) films studied by XAS and XPS , 1999 .
[7] S. Koh,et al. X-ray photoelectron spectroscopy studies of modified surfaces of α-Al2O3, SiO2, and Si3N4 by low energy reactive ion beam irradiation , 1999 .
[8] M. Piancastelli,et al. Electron decay following the N 1s→π* excitation in N2 studied under resonant Raman conditions , 1999 .
[9] K. Furuya,et al. High-resolution XAS spectrum of interstitial nitrogen molecules in the surface oxide matrix of TiAlN film , 1998 .
[10] H. Ichimura,et al. Comparison of surface oxidation of titanium nitride and chromium nitride films studied by x-ray absorption and photoelectron spectroscopy , 1997 .
[11] W. Tong,et al. CORE-LEVEL PHOTOABSORPTION STUDY OF DEFECTS AND METASTABLE BONDING CONFIGURATIONS IN BORON NITRIDE , 1997 .
[12] Bradshaw,et al. Conjugate shake-up-enhanced Auger transitions in N2. , 1995, Physical review. A, Atomic, molecular, and optical physics.
[13] M. Biermann,et al. Coherent excitation of vibrational wave functions observed in core hole decay spectra of O2, N2 and CO , 1994 .
[14] J. Sanz,et al. Thermal oxidation of TiN studied by means of soft x‐ray absorption spectroscopy , 1993 .
[15] A. Kilcoyne,et al. Recent Advances in Studies of the Electronic Decay of Core Excited States in Small Molecules , 1992 .
[16] F. D. Correll,et al. Fundamentals of ion‐beam‐assisted deposition. I. Model of process and reproducibility of film composition , 1990 .
[17] M. Domke,et al. The Vibrational Fine Structure of Chemisorbed C2H4 Molecules in the (1s-1, π*) State , 1990 .
[18] J. Stöhr,et al. Correlation between Electron Emission and Fragmentation into Ions following Soft-X-Ray Excitation of theN2Molecule , 1983 .
[19] R. J. Hawryluk,et al. Exposure and development models used in electron beam lithography , 1981 .