Oxide and interface characteristics of oxidized silicon oxynitride ceramics – an investigation by electron microscopy

[1]  Y. Gogotsi,et al.  Identification of oxidation mechanisms in silicon nitride ceramics by transmission electron microscopy studies of oxide scales , 1995 .

[2]  L. Ogbuji.  The SiO2‐SI3N4 Interface, Part II: O2 Permeation and Oxidation Reaction , 1995 .

[3]  M. Nygren,et al.  Interpretation of the Parabolic and Nonparabolic Oxidation Behavior of Silicon Oxynitride , 1992 .

[4]  L. Ogbuji.  Role of Si2N2O in the Passive Oxidation of Chemically-Vapor-Deposited Si3N4 , 1992 .

[5]  Hiroshi Iwasaki,et al.  SiO2 / Si Interfaces Studied by Scanning Tunneling Microscopy and High Resolution Transmission Electron Microscopy , 1992 .

[6]  R. Larker.  Reaction Sintering and Properties of Silicon Oxynitride Densified by Hot Isostatic Pressing , 1992 .

[7]  G. Dunlop,et al.  Oxidation of pressureless sintered Si2N2O materials , 1991 .

[8]  S. Kanzaki,et al.  Processing, Mechanical Properties, and Oxidation Behavior of Silicon Oxynitride Ceramics , 1991 .

[9]  R. E. Tressler,et al.  Annealing studies of coupled Si3N4 and SiO2 films , 1989 .

[10]  R. E. Tressler,et al.  Thermodynamics of the Si‐N‐O System and Kinetic Modeling of Oxidation of Si3 N 4 , 1989 .

[11]  R. E. Tressler,et al.  Oxidation Studies of Crystalline CVD Silicon Nitride , 1989 .

[12]  F. Ross,et al.  Interface analysis using elastic scattering in the transmission electron microscope: Application to the oxidation of silicon , 1988 .

[13]  R. Sinclair,et al.  The Evolution of Si / SiO2 Interface Roughness , 1987 .

[14]  M. Billy,et al.  Preparation and properties of new silicon oxynitride based ceramics , 1981 .

[15]  P. Boch,et al.  Elastic properties of silicon oxynitride , 1979 .

[16]  A. S. Grove,et al.  General Relationship for the Thermal Oxidation of Silicon , 1965 .

[17]  C. Brosset,et al.  Crystal Structure of Silicon Oxynitride, Si2N2O , 1964, Nature.

[18]  T. Ledaal,et al.  Structure of Si2N2O. , 1964 .