Investigation of the evaporation process conditions on the optical constants of zirconia films.

Deposition parameters required for producing zirconia films for use in optical multilayer systems by electronbeam gun evaporation of zirconia and zirconium starting materials were investigated. The optical constants were determined as a function of distance, partial pressure of oxygen, and angle of incidence. The direct and reactive evaporation processes yielded ZrO(2) films with refractive indices of 2.08 and 2.14, respectively, for vapor incident on the substrate at normal incidence.

[1]  H A Macleod,et al.  Ion-beam-assisted deposition of thin films. , 1983, Applied optics.

[2]  W. Steckelmacher,et al.  The distribution of thin films condensed on surfaces by the vacuum evaporation method , 1952 .

[3]  Elmar Ritter,et al.  Optical film materials and their applications. , 1976, Applied optics.

[4]  M. Balog,et al.  The chemical vapour deposition and characterization of ZrO2 films from organometallic compounds , 1977 .

[5]  T. C. Bagchi,et al.  Low loss ZrO2 films for optical applications in the UV region , 1985 .

[6]  David Smith,et al.  Refractive index of some oxide and fluoride coating materials. , 1979, Applied optics.

[7]  K. Müller,et al.  Model for ion‐assisted thin‐film densification , 1986 .

[8]  C. Carniglia,et al.  Optical and crystalline inhomogeneity in evaporated zirconia films. , 1985, Applied optics.

[9]  H. Kashiwagi,et al.  Excimer Laser Mirror , 1978 .

[10]  J. G. Nelson,et al.  Dense crystalline ZrO2 thin films deposited by pulsed‐laser evaporation , 1987 .

[11]  S. Qadri,et al.  Stabilized zirconia-alumina thin films , 1986 .

[12]  P. Martin,et al.  The preparation and characterization of optical thin films produced by ion‐assisted deposition , 1984 .

[13]  D. M. Sanders,et al.  Microstructure of dielectric thin films formed by e‐beam coevaporation , 1983 .

[14]  J. Siejka,et al.  Calcia-stabilized zirconia thin films in GaAs metal/insulator/semiconductor technology: Reduction of GaAs native oxide , 1983 .

[15]  G. Velasco,et al.  Study of calcia‐stabilized zirconia thin‐film sensors , 1977 .

[16]  D. L. Wood,et al.  Refractive index of cubic zirconia stabilized with yttria. , 1982, Applied optics.

[17]  Jerzy A. Dobrowolski,et al.  Design Of A Prototype Semi-Continuous Roll Coater For Optical Multilayers , 1982, Photonics West - Lasers and Applications in Science and Engineering.

[18]  R. Blickensderfer,et al.  Reactive sputtering of zirconium with oxygen , 1976 .

[19]  Albert Feldman,et al.  Modifying structure and properties of optical films by coevaporation , 1986 .

[20]  G. J. Clark,et al.  Ion‐assisted deposition of bulklike ZrO2 films , 1983 .

[21]  E. Khawaja,et al.  The optical properties of thin films of tantalum pentoxide and zirconium dioxide , 1975 .

[22]  P. Martin,et al.  Modification of the optical and structural properties of dielectric ZrO2 films by ion‐assisted deposition , 1984 .

[23]  H. Pulker,et al.  Characterization of optical thin films. , 1979, Applied optics.

[24]  H A Macleod,et al.  Multiple determination of the optical constants of thin-film coating materials. , 1984, Applied optics.

[25]  J. Dobrowolski,et al.  Transparent, conducting indium tin oxide films formed on low or medium temperature substrates by ion-assisted deposition. , 1987, Applied optics.

[26]  W. Pawlewicz,et al.  Microstructure control for sputter-deposited ZrO2, ZrO2·CaO and ZrO2·Y2O3 , 1982 .

[27]  A. Matthews,et al.  Ionization assisted physical vapor deposition of zirconia thermal barrier coatings , 1986 .

[28]  F Stetter,et al.  New materials for optical thin films. , 1976, Applied optics.