Mapping the potential within a nanoscale undoped GaAs region using a scanning electron microscope
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[1] Mil'shtein. Semiconductor devices "from inside" , 2006, Scanning.
[2] R. F. Broom,et al. Optimizing and quantifying dopant mapping using a scanning electron microscope with a through-the-lens detector , 2003 .
[3] David G. Hasko,et al. Quasi-lateral 2DEG-2DHG junction in AlGaAs/GaAs , 2003, Microelectron. J..
[4] S. Petrosyan,et al. Two-dimensional p-n junction under equilibrium conditions , 2002 .
[5] R. F. Broom,et al. Dopant profiling with the scanning electron microscope—A study of Si , 2002 .
[6] D. Hasko,et al. Lateral p-n Junction in Modulation Doped AlGaAs/GaAs , 2002 .
[7] A. Howie,et al. Threshold Energy Effects in Secondary Electron Emission , 1999, Microscopy and Microanalysis.
[8] I. V. Mitchell,et al. Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging , 1999 .
[9] D. Venables,et al. Secondary electron imaging as a two-dimensional dopant profiling technique: Review and update , 1998 .
[10] Rasit Turan,et al. Mapping electrically active dopant profiles by field‐emission scanning electron microscopy , 1996 .
[11] C. Lavoie,et al. Field-emission SEM imaging of compositional and doping layer semiconductor superlattices , 1995 .
[12] T. Everhart,et al. Simple calculation of energy distribution of low‐energy secondary electrons emitted from metals under electron bombardment , 1974 .
[13] W. Nixon,et al. Electron beam induced potential contrast on unbiased planar transistors , 1967 .
[14] Sealy,et al. Mechanism for secondary electron dopant contrast in the SEM , 2000, Journal of electron microscopy.