论文信息 - Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source - 字舞流文

Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source

Sang Woo Kim | R. Choi | J. Spiegelman | Jiyoung Kim | H. S. Kim | S. Hwang | Y. Jung | A. Ravichandran | Si Joon Kim | Jinho Ahn | Jaidah Mohan | Jiyoung Kim | A. Lucero | D. Alvarez | Dan N. Le | Jin Hyun Kim | Aswin L. N. Kondusamy | S. Kim