论文信息 - Structure analysis of the system Hafnium/Silicon(100) by means of X-ray photoelectron spectroscopy and X-ray photoelectron diffraction (XPD) - 字舞流文

Structure analysis of the system Hafnium/Silicon(100) by means of X-ray photoelectron spectroscopy and X-ray photoelectron diffraction (XPD)

M. Carazzolle | R. Landers | S. Dreiner | U. Berges | C. Westphal | C. R. Flüchter | D. Weier | A. Siervo | G. Kleiman | M. Schürmann