Intrinsic microcrystalline silicon prepared by hot-wire chemical vapour deposition for thin film solar cells

[1]  Hideki Matsumura,et al.  Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method , 1998 .

[2]  C. Mukherjee,et al.  Influence of gas supply and filament geometry on the large-area deposition of amorphous silicon by hot-wire CVD , 2001 .

[3]  J. Müller,et al.  Comprehensive study of microcrystalline silicon solar cells deposited at high rate using 13.56 MHz plasma-enhanced chemical vapor deposition , 2002 .

[4]  Reinhard Carius,et al.  Structural properties of microcrystalline silicon in the transition from highly crystalline to amorphous growth , 1998 .

[5]  B. Rech,et al.  Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells , 1999 .

[6]  M. Stutzmann,et al.  Microcrystalline Silicon Prepared by Hot-Wire Chemical Vapour Deposition for Thin Film Solar Cell Applications , 2002 .

[7]  Bernd Rech,et al.  Intrinsic microcrystalline silicon: A new material for photovoltaics , 2000 .

[8]  D. Staebler,et al.  Reversible conductivity changes in discharge‐produced amorphous Si , 1977 .

[9]  A. Masuda,et al.  Development of Cat-CVD apparatus — a method to control wafer temperatures under thermal influence of heated catalyzer , 2001 .

[10]  F. Finger,et al.  Electronic states in hydrogenated microcrystalline silicon , 1998 .

[11]  Kenji Yamamoto,et al.  Thin film Si solar cell fabricated at low temperature , 2000 .

[12]  O. Vetterl,et al.  Structural Properties of Microcrystalline Si Solar Cells , 2001 .

[13]  Ch. Hof,et al.  On the Way towards High-Efficiency Thin Film Silicon Solar Cells by the "Micromorph" Concept , 1996 .

[14]  M. Stutzmann,et al.  Intrinsic amorphous and microcrystalline silicon by hot-wire-deposition for thin film solar cell applications , 2001 .