The band-gap bowing of AlxGa1−xN alloys
暂无分享,去创建一个
Robert M. Biefeld | Alan Francis Wright | Mary H. Crawford | R. M. Biefeld | S. R. Lee | J. Han | M. Crawford | J. Han | A. F. Wright | G. A. Petersen
[1] Robert M. Biefeld,et al. The effect of H2 on morphology evolution during GaN metalorganic chemical vapor deposition , 1997 .
[2] Bo Monemar,et al. Fundamental energy gap of GaN from photoluminescence excitation spectra , 1974 .
[3] M. Umeno,et al. Optical properties of AlxGa1-xN/GaN heterostructures on sapphire by spectroscopic ellipsometry , 1998 .
[4] M. Cardona. Optical Properties of the Silver and Cuprous Halides , 1963 .
[5] P. Perry,et al. The optical absorption edge of single‐crystal AlN prepared by a close‐spaced vapor process , 1978 .
[6] H. Amano,et al. Heteroepitaxial Growth and the Effect of Strain on the Luminescent Properties of GaN Films on (11 2̄0) and (0001) Sapphire Substrates , 1988 .
[7] T. Moustakas,et al. Growth and Doping of AlGaN Alloys by ECR-assisted MBE , 1996 .
[8] Marc Ilegems,et al. Absorption, Reflectance, and Luminescence of GaN Epitaxial Layers , 1971 .
[9] H. Amano,et al. The Dependence of the Band Gap on Alloy Composition in Strained AlGaN on GaN , 1998 .
[10] W. Rieger,et al. Growth of and AlGaN by MOCVD using triethylgallium and tritertiarybutylaluminium , 1997 .
[11] Isamu Akasaki,et al. Optical Properties of Strained AlGaN and GaInN on GaN , 1997 .
[12] Isamu Akasaki,et al. Energy band‐gap bowing parameter in an AlxGa1−x N alloy , 1987 .
[13] W. Chow,et al. Theory of gain in group-III nitride lasers , 1997 .
[14] M. Gershenzon,et al. Ultraviolet photoluminescence from undoped and zn doped AlxGa1−xN with x between 0 and 0.75 , 1991 .
[15] Jaime A. Freitas,et al. On the origin of electrically active defects in AlGaN alloys grown by organometallic vapor phase epitaxy , 1996 .
[16] Alan Francis Wright,et al. Elastic properties of zinc-blende and wurtzite AlN, GaN, and InN , 1997 .
[17] Joseph A. Miragliotta,et al. High quality self‐nucleated AlxGa1−x N layers on (00.1) sapphire by low‐pressure metalorganic chemical vapor deposition , 1994 .
[18] S. Misawa,et al. Properties of AlxGa1−xN films prepared by reactive molecular beam epitaxy , 1982 .
[19] J. Harris,et al. Growth of epitaxial AlxGa1−xN films by pulsed laser deposition , 1998 .
[20] Robert F. Davis,et al. Correlation of biaxial strains, bound exciton energies, and defect microstructures in gan films grown on AlN/6H-SiC(0001) substrates , 1997 .
[21] R. D. Metcalfe,et al. Growth and properties of GaxAl1-xN compounds , 1978 .
[22] Alan Francis Wright,et al. Bowing parameters for zinc‐blende Al1−xGaxN and Ga1−xInxN , 1995 .
[23] J. Pankove,et al. Epitaxially grown AlN and its optical band gap , 1973 .
[24] I. Akasaki,et al. Edge emission of AlxGa1−xN , 1986 .
[25] R. Davis,et al. Growth, Doping and Characterization of AlxGa1−xN Thin Film Alloys on 6H-SiC(0001) Substrates , 1996 .
[26] Oliver Ambacher,et al. Determination of the Al mole fraction and the band gap bowing of epitaxial AlxGa1−xN films , 1997 .
[27] M. Khan,et al. Properties and ion implantation of AlxGa1−xN epitaxial single crystal films prepared by low pressure metalorganic chemical vapor deposition , 1983 .
[28] Oliver Ambacher,et al. Spectroscopic ellipsometry measurements of AlxGa1−xN in the energy range 3–25 eV , 1998 .