Few-electron edge-state quantum dots in a silicon nanowire field-effect transistor.
暂无分享,去创建一个
Maud Vinet | Marc Sanquer | Sylvain Barraud | Yann-Michel Niquet | Xavier Jehl | François Triozon | Ivan Duchemin | M. Vinet | S. Barraud | Y. Niquet | I. Duchemin | J. Renard | V. Nguyen | F. Triozon | B. Voisin | M. Sanquer | S. de Franceschi | Julien Renard | X. Jehl | Benoit Voisin | Viet-Hung Nguyen | Silvano de Franceschi
[1] R. S. Ross,et al. Pauli spin blockade in undoped Si/SiGe two-electron double quantum dots , 2011, 1106.6285.
[2] Charles M Lieber,et al. Coherent single charge transport in molecular-scale silicon nanowires. , 2005, Nano letters.
[3] Isabelle Ferain,et al. Multigate transistors as the future of classical metal–oxide–semiconductor field-effect transistors , 2011, Nature.
[4] S. Sarma,et al. Intervalley coupling for interface-bound electrons in silicon: An effective mass study , 2010, 1006.3338.
[5] Michelle Y. Simmons,et al. Silicon quantum electronics , 2012, 1206.5202.
[6] B. Previtali,et al. A tunable, dual mode field-effect or single electron transistor , 2012, 1201.3760.
[7] M. Vinet,et al. Background charges and quantum effects in quantum dots transport spectroscopy , 2008, 0810.0672.
[8] Charles M Lieber,et al. Spin states of the first four holes in a silicon nanowire quantum dot. , 2008, Nano letters.
[9] Hongwen Jiang,et al. Parallel spin filling and energy spectroscopy in few-electron Si metal-on-semiconductor-based quantum dots , 2010 .
[10] X Jehl,et al. Detection of a large valley-orbit splitting in silicon with two-donor spectroscopy. , 2012, Physical review letters.
[11] M. Lagally,et al. Single-electron quantum dot in Si∕SiGe with integrated charge sensing , 2007, 0710.3725.
[12] V. Trivedi,et al. Suppression of corner effects in triple-gate MOSFETs , 2003, IEEE Electron Device Letters.
[13] Gerhard Klimeck,et al. Spin-valley lifetimes in a silicon quantum dot with tunable valley splitting , 2013, Nature Communications.
[14] H. Huebl,et al. Observation of the single-electron regime in a highly tunable silicon quantum dot , 2009, 0910.0576.
[15] C. Yang,et al. Spin filling of valley–orbit states in a silicon quantum dot , 2011, Nanotechnology.
[16] M. Mouis,et al. Carrier transport in HfO/sub 2//metal gate MOSFETs: physical insight into critical parameters , 2006, IEEE Transactions on Electron Devices.
[17] Ferry,et al. Surface roughness at the Si(100)-SiO2 interface. , 1985, Physical review. B, Condensed matter.
[18] Insoo Woo,et al. Gate-induced quantum-confinement transition of a single dopant atom in a silicon FinFET , 2008 .
[19] Romain Wacquez,et al. Few electron limit of n-type metal oxide semiconductor single electron transistors , 2012, Nanotechnology.
[20] F. Stern,et al. Electronic properties of two-dimensional systems , 1982 .
[21] L. Dreeskornfeld,et al. A comprehensive study of corner effects in tri-gate transistors , 2004, Proceedings of the 30th European Solid-State Circuits Conference (IEEE Cat. No.04EX850).
[22] D. Rideau,et al. Quantum calculations of the carrier mobility: Methodology, Matthiessen's rule, and comparison with semi-classical approaches , 2013, 1310.1704.
[23] X Jehl,et al. Single-donor ionization energies in a nanoscale CMOS channel. , 2010, Nature nanotechnology.
[24] C. Tavernier,et al. Onsite matrix elements of the tight-binding Hamiltonian of a strained crystal: Application to silicon, germanium, and their alloys , 2009, 0902.0491.
[25] Toshiro Hiramoto,et al. Quantum mechanical effects in the silicon quantum dot in a single-electron transistor , 1997 .
[26] Y. Taur. An analytical solution to a double-gate MOSFET with undoped body , 2000 .