Effects of channel dimensions on performance of a-InGaZnO4 thin-film transistors
暂无分享,去创建一个
S. J. Pearton | David P. Norton | Young-Woo Heo | S. Pearton | D. Norton | Seyul Kim | Joon-Hyung Lee | Jeong-Joo Kim | Y. Heo | Se-Yun Kim | Joon-Hyung Lee | Jeong-Joo Kim | K. Cho | S. Sun | Kwang-Min Cho | Sang-Yun Sun | Sang-Yun Sun
[1] H. Ohta,et al. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors , 2004, Nature.
[2] Noriaki Ikeda,et al. Application of amorphous oxide TFT to electrophoretic display , 2008 .
[3] Joon-Hyung Lee,et al. Transparent amorphous indium zinc oxide thin-film transistors fabricated at room temperature , 2007 .
[4] F. Ren,et al. High performance indium gallium zinc oxide thin film transistors fabricated on polyethylene terephthalate substrates , 2008 .
[5] P. Rack,et al. Device Characteristics of Amorphous Indium Gallium Zinc Oxide TFTs Sputter Deposited with Different Substrate Biases , 2009 .
[6] C. Koo,et al. Compositional influence on sol-gel-derived amorphous oxide semiconductor thin film transistors , 2009 .
[7] Hideo Hosono,et al. Origins of threshold voltage shifts in room-temperature deposited and annealed a-In–Ga–Zn–O thin-film transistors , 2009 .
[8] T. Kamiya,et al. Device characteristics improvement of a-In–Ga–Zn–O TFTs by low-temperature annealing , 2010 .
[9] Pedro Barquinha,et al. Toward High-Performance Amorphous GIZO TFTs , 2009 .
[10] J. F. Conley,et al. Bias stress stability of zinc-tin-oxide thin-film transistors with Al2O3 gate dielectrics , 2010 .
[11] John F. Muth,et al. Bias stress stability of indium gallium zinc oxide channel based transparent thin film transistors , 2008 .
[12] Kimoon Lee,et al. Transparent and Photo‐stable ZnO Thin‐film Transistors to Drive an Active Matrix Organic‐Light‐ Emitting‐Diode Display Panel , 2009 .
[13] Hyuck-In Kwon,et al. Bias-stress-induced stretched-exponential time dependence of threshold voltage shift in InGaZnO thin film transistors , 2008 .
[14] I. Hill,et al. Influence of Channel Stoichiometry on Zinc Indium Oxide Thin-Film Transistor Performance , 2009, IEEE Transactions on Electron Devices.
[15] J. Wager. Transfer‐curve assessment of oxide thin‐film transistors , 2010 .
[16] Jung Woo Kim,et al. Bottom-Gate Gallium Indium Zinc Oxide Thin-Film Transistor Array for High-Resolution AMOLED Display , 2008, IEEE Electron Device Letters.
[17] Jong-Ho Lee,et al. Transfer characteristics and bias-stress stability of amorphous indium zinc oxide thin-film transistors , 2009 .
[18] Ji Sim Jung,et al. Threshold Voltage Control of Amorphous Gallium Indium Zinc Oxide TFTs by Suppressing Back-Channel Current , 2009 .
[19] S. Pearton,et al. Effects of ambient atmosphere on the transfer characteristics and gate-bias stress stability of amorphous indium-gallium-zinc oxide thin-film transistors , 2010 .
[20] Xiao Zou,et al. Improved electrical characteristics and reliability of amorphous InGaZnO metal-insulator-semiconductor capacitor with high kappa HfOxNy gate dielectric , 2010, Microelectron. Reliab..
[21] E. Fortunato,et al. Fully Transparent ZnO Thin‐Film Transistor Produced at Room Temperature , 2005 .
[22] S. H. Kim,et al. Low Temperature Solution-Processed InZnO Thin-Film Transistors , 2010 .
[23] Yeon-Gon Mo,et al. Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors , 2008 .
[24] F. Ren,et al. Improvement in bias stability of amorphous-InGaZnO4 thin film transistors with SiOx passivation layers , 2010 .
[25] Hideo Hosono,et al. Amorphous oxide channel TFTs , 2008 .
[26] Changjung Kim,et al. Amorphous gallium indium zinc oxide thin film transistors: Sensitive to oxygen molecules , 2007 .