Process and device modeling

Preface. 1. Physical Models and Numerical Methods for VLSI Process Simulation (B. R. Penumalli). 2. Ion Implantation Models for Process Simulation (H. Ryssel, J. P. Biersack). 3. Simulation of Lithography (A. R. Neureuther, W. G. Oldham). 4. Physical Models for Numerical Device Simulation (G. Baccarani et al.). 5. Basic Theory of Stationary Numerical Models (M. S. Mock). 6. New Approaches to Submicron Device Modelling (A. Yoshii, M. Tomizawa). 7. Computational Aspects of Semiconductor Device Simulation (R. E. Bank et al.). 8. On Modeling MOS-Devices (S. Selberherr). 9. Three-Dimensional Device Simulation using a Mixed-Process/Device Simulator (N. Shigyo, R. Dang). 10. Numerical Model Hierarchies (H. K. Dirks). 11. The Application of Process and Device Simulation Tools to VLSI Development (E. J. Prendergast, P. Lloyd, W. T. Cochran). 12. Compact MOSFET Modeling (F. M. Klaassen). 13. Compact Bipolar Transistor Modeling (H. C. De Graaff). 14. Device and Circuit Simulator Integration Techniques (T. Shima).