Al2O3 with Metal-Nitride nanocrystals as a charge trapping layer of MONOS-type nonvolatile memory devices
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H. Hwang | S. Jeon | Seonghyun Kim | Dong‐Yu Kim | Sangmoo Choi | Hyun-Deok Yang | Chungwoo Kim | M. Chang
暂无分享,去创建一个
H. Hwang | S. Jeon | Seonghyun Kim | Dong‐Yu Kim | Sangmoo Choi | Hyun-Deok Yang | Chungwoo Kim | M. Chang