The influence of MOVPE process parameters on the buffer resistivity used in AlGaN/GaN heterostructures

The influence of growth conditions on properties of high temperature GaN (HT-GaN) buffer used in AlGaN/GaN HEMT heterostructures was studied. Many various factors are presumed to have significant impact on the concluding properties of HT-GaN buffer. In this paper the nucleation layer growth time as well as temperature during high temperature GaN layer growth was selected as a factors alleged to cause variation in final GaN layer properties. The study was designed to show step by step improvement of HT-GaN buffer with consecutive changes of particular parameters. Electrical properties of the AlGaN/GaN heterostructures were determined using impedance spectroscopy method performed with HP 4192A impedance meter equipped in two contact mercury probe. Laser reflectance traces acquired in-situ during MOVPE (Metalorganic Vapor Phase Epitaxy) growth were compered and analyzed in order to correlate growth mechanism with electrical properties of HT-GaN buffer. The improvement of HT-GaN resistivity was shown through decrement of capacitance in the depleted space-charge region.